Instruction manual

Cantilever Preparation
Silicon Cantilever Substrates
62 MultiMode SPM Instruction Manual Rev. B
Figure 4.1e Silicon Probe—Common Shape Artifact
Due to the nature of the etching process that shapes the tip, there is often a short angled ridge near
the highest point of the tip. The exact length of the ridge is variable but rarely exceeds 0.5µm in
total length. It is inclined steeply, so that for reasonably flat surfaces the highest point is the only
one which interacts with the surface. Depending on the tip in use, sample features of approximately
0.5µm in height can begin to produce artifacts of an apparent shallow slope over scan fields of
larger than 1–2µm.
20 - 30°