Specifications

OPERATION OF THE MAK
VACUUM SYSTEMS
To successfully operate the MAK Series, a leak-tight vacuum system must be available. This sys-
tem should be pumped with a high vacuum pump of the turbo, or a cryo type. It may be necessary
to have a throttle valve, or orifice in the system to control pump throughput while the sputtering gas
is introduced. If a cryopump is used, the throttle valve may not be required, however, it is desirable
if sputtering gas pressures of more than five microns are to be used.
The vacuum system should be equipped with suitable gauging to measure and monitor pressures
in the 0.5-600 micron range during sputtering, and the 1x10
-5
to 1x10
-9
torr range during pre-sputter
pump down. The system must also be equipped with a fine metering valve and separate in-series
shut-off valve used for the introduction of the sputtering gas.
A suitable fixture for mounting and holding the substrate(s) during film deposition should be pro-
vided, in conjunction with a means of shuttering the source (target) from the substrate during pre-
cleaning of the target.
Since the MAK Series will not operate properly if the shutter is positioned too close to the
target, it is suggested that the total distance from target to shutter be at least 1”.
Issued September 11, 2008
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