Instruction Manual

7 Manual control
797 VA Computrace – Software
202
Plating solution [ 48 characters ; ]
Name of electrolyte solution used for film deposition.
Stirrer/RDE (rpm) [ 0...3000 rpm ; 2000 rpm ]
Revolutions per minute of the rotating disk electrode. The
stirring of the RDE remains active during all preparation pro-
cedure steps until the start of the cleaning sweep.
Purge time (s) [ 0...80600 s ; 300 s ]
Time of inert gas purging before the first measurement of the
sample solution.
Conditioning cycles
Before deposition, the solid state electrode can be electro-
chemically regenerated by a freely selectable number of con-
ditioning cycles. For every cycle, the voltage is changed at a
sweep rate of 1 V/s to the
End potential and then decreased
at the same rate back to the Start potential.
Start potential (V) [ -5...+5 V ; -1.2 V ]
Start voltage for the cyclic conditioning sweep.
End potential (V) [ -5...+5 V ; -0.1 V ]
Final voltage for the cyclic conditioning sweep.
No. of cycles [ 0...X ; 0 ]
Number of conditioning cycles.
Deposition potential (V) [ -5...+5 V ; -0.8 V ]
Voltage applied to the electrodes during the Deposition time.
Deposition time (s) [ 0...80600 s ; 10 s ]
Time during which the Deposition potential is applied to the
electrodes.
Cleaning potential (V) [ -5...+5 V ; -0.05 V ]
Voltage applied to the electrodes during the Cleaning time.
Cleaning time (s) [ 0...80600 s ; 10 s ]
Time during which the Cleaning potential is applied to the
electrodes.