Hardware manual

6-12 Agilent 7500 Series ICP-MS Hardware Manual
6 Technical Information
capacitive coupling between the plasma and the RF coil, which creates a
potential in the plasma (Figure 129). The potential in the plasma is oscillating
at the radio frequency of the plasma.
Figure 129 Electrical Model of the Plasma and the Interface Region
Figure 130 Distribution of Ions and Electrons around the Interface
EE
Maching
Network
RF Source
Ion Energy
Plasma Potential
Sampling
Cone
Skimmer
Cone
Work Coil
Sample In
To rc h
Work Coil
Potential
t
t
Sheath
Boundary Layer
Ar
+
e
-
e
-
e
-
e
-
e
-
Ar
+
Ar
+
Ar
+
Ar
+
Ar
Ar
Ar
Ar
Ar
Ar
Ar
Ar