Manual

Chapter 3: Getting Started
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10
Chemical Resistance of CentriVap micro
IR Components
Your CentriVap micro IR Vacuum Concentrator is designed to be chemical
resistant to compounds that are commonly used in the concentration processes.
However, by necessity, the CentriVap is comprised of a number of different
materials, some of which may be attacked and degraded by certain chemicals. The
degree of degradation is obviously dependent on the concentration and duration of
exposure. Some major components of the CentriVap that are susceptible to
degradation are as follows:
Acids Bases Solvents
COMPONENT MATERIAL
Acetic Acid 20% Boric Acid Formic Acid Hydrobromic Acid 20% Hydrochloric Acid 20% Nitric Acid 20% Sulfuric Acid 10% Ammonium Hydroxide Acetone Acetonitrile Chloroform Dimethyl Formamide Dimethyl Sulfoxide (DMSO) Ethanol Ethyl Acetate Hexanes Isoproponal Methanol Methylene Chloride Toluene Water
Chamber
Hub/nut
NI-Chrome plate
D D D D D A D A A A A A A
Chamber PTFE coated
Aluminum
A A A A A A A A A A A A A A A A A A A
Rotor PTFE coated
Aluminum
A A A A A A A A A A A A A A A A A A A
Lid Gasket Silicone
C A C D D D A D D D A C C C A A D A
Tubing Silicone
C A C D D D A D D D A C C C A A D A
Motor shaft Stainless Steel C C C D D A A A A A A A A A A A A A A
Bearings Stainless Steel C C C D D A A A A A A A A A A A A A A
Vacuum pump EPDM
FPM
PPS
PTFE
A
C
A
A
A
A
A
A
A
A
A
A
A
A
A
A
A
A
D
A
C
A
A
A
A
D
A
A
D
D
A
A
D
D
A
D
A
A
A
A
A
A
A
A
C
A
A
A
A
A
A
C
A
A
A
C
A
A
A
D
C
A
A
D
A
A
A
A
A
A
A
A- Acceptable
C-Moderate Degradation-Questionable use
D-Severe Degradation-Infrequent use recommended-immediate thorough
cleaning required.
When using compounds in the CentriVap micro IR that are hostile to the materials
of construction, it is imperative that the equipment is appropriately maintained.
• After each run, clean up all residues, spills and materials that might have
splashed in the chamber using agents suitable for the substance involved.
• Remove the contents and clean the glass trap after each use.