User manual

Mask Testing
R&S
®
RTO
231User Manual 1316.0827.02 ─ 06
Common settings:
● "Definition type" on page 226
● "Source" on page 225
● "Wfm Arithmetic" on page 34
Create mask
Creates the upper and lower mask limit from the envelope of the selected reference
waveform. If the reference waveform was not defined before, it is created automatically
from the mask test "Source" waveform which is selected in the "Test Defintion" tab.
SCPI command:
MTESt:WFMLupdate on page 606
Used reference
Sets the reference waveform from which the mask is created.
The reference waveform can be created before with "Reference Waveform Setup", or
loaded from a file in the lower part of the dialog box. If the reference waveform was not
defined before mask definition, it is created automatically from the mask test "Source"
waveform.
SCPI command:
MTESt:REFWfm on page 605
Horizontal width
Sets the width of the mask in horizontal direction. The specified number of divisions is
added to the positive x-values and subtracted from the negative x-values of the mask
limits in relation to the source waveform of the mask. The overall mask width is twice the
specified horizontal width.
Reference for Masks