User guide

Advanced User Guide 9
Setting the oven parameters for constant temperature 282
Setting the oven parameters for ramped temperature 282
About the Oven Insert 284
About Columns 285
Selecting the correct packed glass column type 285
About the column modes 285
Select a column mode 286
Setting the column parameters for constant flow or constant
pressure 287
Enter a flow or pressure program (optional) 287
Programming column pressure or flow 288
Backflushing a Column 289
Backflushing when connected to an MSD 289
Backflushing using a capillary flow technology device 290
Nickel Catalyst Tube 295
About the nickel catalyst tube 295
Nickel catalyst gas flows 295
Setting temperatures for the nickel catalyst tube 296
10 Detectors
About Makeup Gas 298
About the FID 299
How FID units are displayed in Agilent data systems and on the GC 300
To light the FID flame 300
To extinguish the FID flame 300
FID automatic reignition (Lit offset) 301
Recommended starting conditions for new FID methods 301
Setting parameters for FID 302
About the TCD 304
TCD pneumatics 306
TCD carrier, reference, and makeup gas 306
TCD gas pressures 307
Selecting reference and makeup flows for the TCD 308
Chemically active compounds reduce TCD filament life 308
Changing the TCD polarity during a run 309
Detecting hydrogen with the TCD using helium carrier gas 309
Setting parameters for the TCD 309
About the uECD 312
uECD safety and regulatory information 312
uECD warnings 313
Safety precautions when handling uECDs 315